RUKKUN, J.; WONGPISAN, W.; WAREE, K.; AIEMPANAKIT, K. Influence of Nitrogen Flow Rate on Properties of TiAlN Thin Film Prepared by Reactive DC Magnetron Sputtering. Burapha Science Journal, Chonburi, Thailand, v. 26, n. 3 September-December, p. 1575–1590, 2026. Disponível em: https://li05.tci-thaijo.org/index.php/buuscij/article/view/1377. Acesso em: 2 sep. 2026.