Rukkun, Jariyaporn, Witthawat Wongpisan, Kirati Waree, and Kamon Aiempanakit. “Influence of Nitrogen Flow Rate on Properties of TiAlN Thin Film Prepared by Reactive DC Magnetron Sputtering”. Burapha Science Journal 26, no. 3 September-December (March 19, 2026): 1575–1590. accessed September 2, 2026. https://li05.tci-thaijo.org/index.php/buuscij/article/view/1377.